Engineering the Growth of MoS2 via Atomic Layer Deposition of Molybdenum Oxide Film Precursor

Publication date: 1 Ott 2016

JournalSource: LEGACY

The growth of atomically thin MoS 2 films is achieved by sulfurization of molybdenum oxide precursor films grown by atomic layer deposition. The quality features of the MoS 2 films are engineered controlling the stoichiometry, morphology, and thickness of the precursors. The interface interaction between the precursor films and the substrates (SiO 2 or sapphire) plays a key role in the MoS 2 formation.

Origin
Advanced Electronic Materials
Legacy ID
56209d2a46ede8b67672fd4e1e5a12aa
Biblio references
Volume: 2 Issue: 10 Pages: 1600330