A method for forming a graphene layer on a semiconductor substrate, a semiconductor diode utilizing the method for graphene layer formation, and an optoelectronic semiconductor device also utilizing the method for graphene layer formation are provided. An example method for disposing a graphene layer on a semiconductor substrate may include depositing a metal catalyst layer on a top surface of the semiconductor substrate and patterning the metal catalyst layer, such that one or more portions of the top surface of the semiconductor substrate are covered by one or more metal catalyst layer structures. The method may further include facilitating a graphene growth process on an exposed surface of the one or more metal catalyst layer structures, wherein the graphene growth process forms the graphene layer on the exposed surfaces of the one or more metal catalyst layer structures.