A Comparison Study of Substrates Quality for GaN Vertical Devices

Publication date: 20 Feb 2025

ConferenceSource: LEGACY

In this work, a comparison study of four different freestanding GaN substrates is performed by Deep-Level Transient Spectroscopy (DLTS) on Schottky diodes. Three defects are clearly identified, E1 (ET = 0.08-0.14 eV), E2 (ET = 0.55-0.60 eV) and E3 (ET = 0.86-0.91 eV). Comparing the concentration for the different substrates reveals the absence of E3 trap and a lower concentration of E2 trap for the epilayer on the substrate grown within GaN4AP consortium by the ammonothermal technique.

Origin
International GaN4AP Workshop: GaN for Advanced Power Applications
Legacy ID
29a60345d8e182fa36da3b588d01a728