Direct laser writing (DLW) has arise interest in a variety of fields due to the capabilities that we get from the realization of 2D and 3D structures with high resolution fabrication techniques. Multi-photon lithography (MPL) relies on non-linear absorption effects, making possible the fabrication of metasurfaces with feature size beyond the diffraction limit. A new approach in this direction is to use thin films in order to fabricate planar surfaces, known as metasurfaces, that can manipulate light in different forms and can provide a new process with significant advantages in fabrication time, the cost and the usage of masks compared to conventional lithographic techniques.