Towards aluminum oxide/aluminum nitride insulating stacks on 4H–SiC by atomic layer deposition

Publication date: 20 Feb 2024

JournalSource: OPENALEXOpenAlex type: articleClosed Access
Authors: Bruno Galizia, Patrick Fiorenza, Emanuela Schilirò, B. Pécz, Zsolt Foragassy, Giuseppe Greco, Mario Saggio, Salvatore Cascino, Raffaella Lo Nigro, Fabrizio Roccaforte
Origin
Materials Science in Semiconductor Processing
Volume
174
Pages
108244
Cited by
10