Simulation of damage induced by ion implantation in Lithium Niobate

Publication date: 15 Nov 2010

JournalSource: LEGACY

A simulation tool has been developed to engineer the damage formation in Lithium Niobate by ion irradiation with any atomic number and energy. Both nuclear and electronic processes were considered and, in particular, the dependence on the ion velocity of the electronic excitation damage efficiency has been taken into account. By using this tool it is possible both to draw damage nomograms, useful to qualitatively foresee the result of a given process, and to perform reliable simulations of the defect depth profiles, as demonstrated by the good agreement with the experimental data available in the literature.

Publisher
North-Holland
Origin
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Legacy ID
f3f3caa6a4abaccc3da05406360b82c2
Biblio references
Volume: 268 Issue: 22 Pages: 3452-3457